CPC Class H04N

A radiation image detector with automatic exposure detection includes a high voltage circuit unit for providing an operation bias. An image sensing panel includes semiconductor multi-layer structure, receives the operation bias and senses an incident X-ray, and produces holes and electrons. The holes produce positive charges for forming an image. An automatic exposure detector is coupled to the high voltage circuit unit to transfer the operation bias and detects variation pattern with time of a voltage signal or a current signal induced by the electrons to determine an onset time or a cessation time for exposure. A control unit couples to the high voltage circuit unit, the image sensing panel, and the automatic exposure detector and configured to perform system control, including obtaining an image signal from the image sensing panel. An imaging unit couples to the control unit to process the image signal and display and store the image.

An image capturing apparatus that includes a polarizing filter of a slit type in which polarization characteristics are improved is realized. A polarizing unit (10) of an image capturing apparatus (100) includes a first polarizer layer (120a) and a second polarizer layer (120b) that hold a dielectric layer (14) therebetween, and a plurality of slits (13) that are arranged at regular intervals in a predetermined direction are formed in each of the first polarizer layer (120a) and the second polarizer layer (120b). A forming material of each of the first polarizer layer (120a) and the second polarizer layer (120b) and a forming material of a wiring layer that controls an operation of a light receiving unit (11) are selected from Al, Si, Cu, Au, Ag, Pt, W, Ti, Sn, In, Ga, Zn, and a compound or alloy that contains at least one of the foregoing.

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

A projector including: a display unit equipped with an image-forming surface made up of a plurality of pixels; a projection lens that is capable of focus adjustment and that projects an image that is formed on the image-forming surface onto a projection surface; a distortion correction processing unit that, on the basis of distortion correction data for correcting distortion of an image projected onto the projection surface, generates a corrected image by enlarging and/or reducing an image indicated by an input video signal and forms the corrected image on the image-forming surface; and a control unit that adjusts the focus of the projection lens on the basis of the distortion correction data such that a focus range on the projection surface is increased.