Processes for rapidly and accurately measuring the coefficient of moisture expansion for materials, such as adhesives, are disclosed. A replication technique may be used to manufacture highly flat and smooth adhesive samples. Moisture is introduced in a controlled humidity atmosphere, distortion is monitored with an accurate laser interferometer (e.g., ˜1 nanometer (nm) accuracy), and measurements are correlated with moisture content change. Such processes decrease sample size by three orders of magnitude as compared with conventional techniques and have a smaller adhesive mass requirement, which enables measurement of expensive microelectronic adhesives that were previously cost-prohibitive to measure. Also, thinner films allow CME measurements of ultraviolet (UV) cured adhesives that would otherwise have depth of penetration issues. Furthermore, saturation occurs quickly, allowing pre-stabilization at room temperature, which enabled parametric studies as a function of processing or cure state. Additionally, testing occurs within hours versus months, enabling short lead times for root-cause investigations.
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2. The method of claim 1, wherein the film is an adhesive film.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin adhesive film sample, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these measured changes with changes in moisture content. This technique reduces sample size significantly, enabling measurements for adhesives, including expensive microelectronic adhesives or UV-cured adhesives, that were previously challenging to test.
4. The method of claim 1, wherein the two or more coupons have a film thickness with a uniformity of 200 nanometers (nm) or less, a surface flatness of less than 200 nm, and a surface roughness of 25 nm or less.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating highly precise thin film samples (referred to as coupons), exposing them to a controlled humidity atmosphere, precisely monitoring changes in their distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. The film samples used in this method are specifically prepared to have a thickness uniformity of 200 nanometers or less, a surface flatness of less than 200 nm, and a surface roughness of 25 nm or less, enabling highly accurate distortion measurements.
5. The method of claim 1, wherein a cross section of the film is 25 to 75 nanometers (nm).
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a very thin film sample with a cross-section (thickness) between 25 to 75 nanometers, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. Using such thin films significantly reduces sample size, speeds up saturation, and enables testing of materials like UV-cured adhesives.
6. The method of claim 1, wherein the changes in the curvature of the film and changes in height of each pixel are determined by subtracting an initial surface image from an image at a given time, producing a subtracted image.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin film sample, exposing it to a controlled humidity atmosphere, and precisely monitoring changes in its distortion using a laser interferometer. Specifically, the method determines changes in the film's curvature and the height of individual points (pixels) by capturing an initial surface image and subtracting it from a subsequent image taken at a later time, thereby producing a "subtracted image" that highlights only the changes. These changes are then correlated with moisture content.
7. The method of claim 6, wherein the subtracted image comprises a pixel-by-pixel topographic map of the changes in the curvature of the film.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin film sample, exposing it to a controlled humidity atmosphere, and precisely monitoring changes in its distortion using a laser interferometer. The method determines changes in the film's curvature and height by subtracting an initial surface image from a later image, producing a "subtracted image." This subtracted image specifically functions as a detailed, pixel-by-pixel topographic map, visually representing the exact changes in the film's curvature across its surface over time. These changes are then correlated with moisture content.
9. The method of claim 1, wherein the film is an adhesive, the adhesive comprising a microelectronic adhesive or an ultraviolet (UV) cured adhesive.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin film sample, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these measured changes with changes in moisture content. In this method, the material film is an adhesive, specifically designed for applications like microelectronics, or an adhesive cured using ultraviolet (UV) light. This technique allows for the measurement of such specialized adhesives that were previously difficult or costly to test due to their small quantity or depth of penetration issues with conventional methods.
11. The method of claim 10, wherein the two or more coupons have a film thickness with a uniformity of 200 nanometers (nm) or less, a surface flatness of less than 200 nm, and a surface roughness of 25 nm or less.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating highly precise thin film samples (referred to as coupons), exposing them to a controlled humidity atmosphere, precisely monitoring changes in their distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. The film samples used in this method are specifically prepared to have a thickness uniformity of 200 nanometers or less, a surface flatness of less than 200 nm, and a surface roughness of 25 nm or less, enabling highly accurate distortion measurements.
12. The method of claim 10, wherein a cross section of the adhesive film is 25 to 75 nanometers (nm).
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a very thin adhesive film sample with a cross-section (thickness) between 25 to 75 nanometers, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. Using such thin adhesive films significantly reduces sample size, speeds up saturation, and enables testing of materials like UV-cured adhesives.
13. The method of claim 10, wherein the changes in the curvature of the adhesive film and changes in height of each pixel are determined by subtracting an initial surface image from an image at a given time, producing a subtracted image.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin adhesive film sample, exposing it to a controlled humidity atmosphere, and precisely monitoring changes in its distortion using a laser interferometer. Specifically, the method determines changes in the adhesive film's curvature and the height of individual points (pixels) by capturing an initial surface image and subtracting it from a subsequent image taken at a later time, thereby producing a "subtracted image" that highlights only the changes. These changes are then correlated with moisture content.
14. The method of claim 13, wherein the subtracted image comprises a pixel-by-pixel topographic map of the changes in the curvature of the adhesive film.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin adhesive film sample, exposing it to a controlled humidity atmosphere, and precisely monitoring changes in its distortion using a laser interferometer. The method determines changes in the adhesive film's curvature and height by subtracting an initial surface image from a later image, producing a "subtracted image." This subtracted image specifically functions as a detailed, pixel-by-pixel topographic map, visually representing the exact changes in the adhesive film's curvature across its surface over time. These changes are then correlated with moisture content.
16. The method of claim 10, wherein the adhesive film comprises a microelectronic adhesive or an ultraviolet (UV) cured adhesive.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin adhesive film sample, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these measured changes with changes in moisture content. In this method, the adhesive film is specifically a microelectronic adhesive or an adhesive cured using ultraviolet (UV) light. This technique allows for the measurement of such specialized adhesives that were previously difficult or costly to test due to their small quantity or depth of penetration issues with conventional methods.
18. The method of claim 17, wherein the film is an adhesive film.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin adhesive film sample, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these measured changes with changes in moisture content. This technique reduces sample size significantly, enabling measurements for adhesives, including expensive microelectronic adhesives or UV-cured adhesives, that were previously challenging to test.
19. The method of claim 18, wherein the adhesive film comprises a microelectronic adhesive or an ultraviolet (UV) cured adhesive.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin adhesive film sample, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these measured changes with changes in moisture content. The film being measured is an adhesive, specifically either a microelectronic adhesive or an ultraviolet (UV) cured adhesive. This allows for rapid testing of specialized adhesives previously difficult to measure.
20. The method of claim 17, wherein an amount of material in the film is less than one gram (g).
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin film sample with an amount of material weighing less than one gram, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. This enables cost-effective measurement of expensive materials like microelectronic adhesives, as only a minuscule sample amount is required.
21. The method of claim 17, wherein the two or more coupons have a film thickness with a uniformity of 200 nanometers (nm) or less, a surface flatness of less than 200 nm, and a surface roughness of 25 nm or less.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating highly precise thin film samples (referred to as coupons), exposing them to a controlled humidity atmosphere, precisely monitoring changes in their distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. The film samples used in this method are specifically prepared to have a thickness uniformity of 200 nanometers or less, a surface flatness of less than 200 nm, and a surface roughness of 25 nm or less, enabling highly accurate distortion measurements.
22. The method of claim 17, wherein a cross section of the film is 25 to 75 nanometers (nm).
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a very thin film sample with a cross-section (thickness) between 25 to 75 nanometers, exposing it to a controlled humidity atmosphere, precisely monitoring changes in its distortion (e.g., curvature, height) using a laser interferometer, and correlating these changes with moisture content. Using such thin films significantly reduces sample size, speeds up saturation, and enables testing of materials like UV-cured adhesives.
23. The method of claim 17, wherein the changes in the curvature of the film and changes in height of each pixel are determined by subtracting an initial surface image from an image at a given time, producing a subtracted image.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin film sample, exposing it to a controlled humidity atmosphere, and precisely monitoring changes in its distortion using a laser interferometer. Specifically, the method determines changes in the film's curvature and the height of individual points (pixels) by capturing an initial surface image and subtracting it from a subsequent image taken at a later time, thereby producing a "subtracted image" that highlights only the changes. These changes are then correlated with moisture content.
24. The method of claim 23, wherein the subtracted image comprises a pixel-by-pixel topographic map of the changes in the curvature of the film.
A method for rapidly and accurately measuring the Coefficient of Moisture Expansion (CME) of materials. This involves creating a thin film sample, exposing it to a controlled humidity atmosphere, and precisely monitoring changes in its distortion using a laser interferometer. The method determines changes in the film's curvature and height by subtracting an initial surface image from a later image, producing a "subtracted image." This subtracted image specifically functions as a detailed, pixel-by-pixel topographic map, visually representing the exact changes in the film's curvature across its surface over time. These changes are then correlated with moisture content.
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September 21, 2021
March 26, 2024
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